Evactron® E16
The Evactron E16 De-Contaminator is a compact yet simplified plasma cleaner for Electron and Ion Beam Instrument load locks such as SEMs, TEMs, FIBs, and sample preparation chambers. The E16 delivers gentle and effective cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
New design features of the Evactron E16 Plasma Radical Source (PRS) include a unique flush-mounting flange and compact size to fit in restricted spaces on a chamber wall. The Evactron E16 Power Centre controller has a small footprint and can be placed horizontally or vertically to conserve space.
Key Features
- Flush-mounting flange: A unique flush-mount flange fits in restricted spaces on a chamber wall
- Compact PRS: A small Plasma Radical Source built for tight clearances around the instrument
- Space-saving controller: A small-footprint Power Centre, mountable horizontally or vertically
- Touchpad recipes: Cleaning recipes are programmed directly via touchpad
- Auto-tune ignition: Automatically tunes the plasma — no match-tuning or gas-flow adjustments needed
- Turbo-pump (TMP) compatible: Clean with the turbo pump running and no advance venting; TÜV, NRTL and CE certified
- Certified: RoHS, CE, NRTL, TUV and SEMI S2 compliant
- Alternate-gas capability: Runs on air or alternate process gases for tailored cleaning chemistry
- Non-damaging: Gentle downstream cleaning that protects sensitive samples and components
- Dual-action cleaning: Combines plasma and UV afterglow to remove hydrocarbon contamination
- Pop Ignition: Patent-pending ignition technology at high vacuum
Manufacturer
Evactron Plasma Cleaning by XEI Scientific
For almost three decades XEI Scientific has helped researchers, engineers, and manufacturers to maintain cleaner vacuum environments for electron microscopy and advanced analytical instrumentation.
XEI Scientific pioneered downstream plasma cleaning for electron microscopes and introduced the Evactron® De-Contaminator, the first commercial in-situ plasma cleaning system for electron microscope vacuum chambers. Today, Evactron plasma cleaning technology is trusted by laboratories worldwide to remove hydrocarbon contamination, support pristine vacuum conditions, and improve performance across SEM, TEM, FIB, UHV, EUV, X-ray optics, and specimen-preparation applications.
Their mission is straightforward: to help scientists and engineers achieve cleaner systems, clearer data, and more dependable results. As XEI Scientific enters its next chapter, we remain committed to practical innovation, responsive customer support, and the high standards of quality and reliability that have defined the Evactron name.
Downloads
E16 Product Data Sheet
Service Support
Comprehensive repairs and servicing
Annual Support Programs
Your metrology instrumentation is a major investment that is critical to your business operation and success. In today’s competitive climate, it is more important than ever to extend the functionality and peak performance of your metrology equipment years beyond the expiration of your factory warranty. CN Tech’s Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.
With over 20 years’ experience servicing and repairing you can be assured that your system is in safe hands. The independent services we offer include system relocation, maintenance visits, parts and consumables, and break down interventions.
CN Tech’s Support Programs are an economical way to guarantee optimal working condition:
- Annual Preventive Maintenance
- Priority Technical Assistance
- Preferred Parts Availability
- On-Site User Training
- Remote Diagnostics
- No surprise repair expense and much more!
Support Contact Example
An example of our service and support contracts are shown below:
Metrology & Instrumentation Annual Support Programs 2024/25
CN Tech's Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.