- Turbo molecular pump with different pumping speeds (optional)
- Independent sputtering control rate for each cathode to produce fine grain structures
- Unlimited deposition time without breaking the vacuum
- Maximum 6 mm target thickness (Including backing plate)
- Automatic control of deposition power independent of pressure
- Automatic control of the cathode’s temperatures to protect the life time of the magnets
- Electronic throttle valve for 350 l/s turbo pump
- Records and plots coating parameters graphs
- Deposition process curves and data transfer by a USB port to PC
- 0-1200 V, 0-500 mA DC power supply
- 300 W RF power supply with automatic matching box (optional)
- 0-24 V, 0-100 A high-current power supply
- Water-cooled high-current electric feedthroughs
- Utilities: 220 V – 110 V, 50/60 HZ
- Max. consuming power: 3 kW
- Dimensions: 770 H x 600 W x 800 D mm (Without Rack)
- Weight: 160 kg (Pump, rack, and instrument case)
DST3-T – Sputter Coater and Thermal Evaporator
The DST3-T is a triple-target turbomolecular-pumped multi vacuum-coating system that combines thermal evaporator and sputter coater in one single compact desktop system. The high vacuum system is suitable for deposition of a wide range of materials. The triple magnetron target desk sputter coater can easily switch between evaporation and sputtering condition (not simultaneously).
Manufacturer
Vac Coat
Vac Coat Limited is a designer and manufacturer of high-quality tailor-made Physical Vapour Deposition (PVD) and Vacuum Coating Systems with excellent customer care and after sale services. Equipped with more than 25 years’ experience in the vacuum and Thin Film deposition technologies. Their research and development team supported by academic scientists and qualified engineers are highly active to develop new designs and meet special inquiries received from clients. Designed and manufactured components by Vac Coat's engineering team meets high-quality standards. Their vacuum coating systems have been sold to many universities and research centres through distributors worldwide with very good references and feedback.
Key Features
- High vacuum level with built-in turbo pump
- Two-stage rotary vane backing pump (diaphragm and scroll pump)
- DC and RF (optional) power supplies suitable for metals, semiconductors, and dielectrics
- Three 2” water-cooled angled, magnetron cathodes suitable for producing alloy films (DST3-A) and multilayer deposition
- Large sample holder stage (8 inches) for DST3-TS
- Cathode mask designed for large substrate uniform deposition (DST3-TS)
- Two fixed and movable quartz crystal monitoring systems for real time thickness measurement (1 nm precision)
- Gas injection control through two precision Mass Flow meters (MFC) for fine control of vacuum pressure and Ar flow or reactive sputtering gas
- Full range vacuum gauge
- Cathode selection motor
- Sample rotation, height, and tilt adjustable (For 3-inch sample holders)
- Three manual or electronic (optional) shutters
- One thermal source holder
- Two-year warranty
- CE conformity
- Intuitive touch screen to control the coating process and rapid data input
- User friendly software, updatable via network
- Semi-Full automatic timed or thickness coating process (optional)
- Repeatable and programmable sputtering process in the automatic mode
- Adjustable DC/RF/High-current deposition parameters adjustable through the touch screen panel (optional)
- Records and plots coating parameters graphs
- Automated cathode selection
Overview
The DST3-T is equipped with a large chamber (300 mm diameter) and three 2” diameter water-cooled cathodes which make it suitable for long time sputter deposition. The magnetron desk sputter coater is equipped with RF and DC power supplies. It can sputter semiconductors, dielectrics, and metal (oxidising and noble) targets.
The DST3-T sputter coating system with RF power supply is equipped with an auto adjustable matching box, minimising the reflected power in the RF sputtering process. This model contains optional features to increase coated film adhesion to the substrate and improve the film structure, such as a 500 ˚C heater to be installed to heat the substrate during the deposition process, or a 300 V DC bias voltage can be applied to the substrate.
According to state of the cathodes, DST3-T is available in two models:
- DST3 – TA (Angled Cathodes):
The DST3-TA is equipped with three angled cathodes with a common focal point. The sputter coater system can sputter from two or three (optional) targets simultaneously or independently to form alloys or multilayer deposition, respectively. The maximum size of substrates in this model could be 3 inches.
- DST3 –TS (Straight Cathodes):
DST3-TS with three straight 2-inch water-cooled cathodes is suitable for sputtering a single large specimen with diameter up to 20 cm or several small specimens.
Thermal Evaporation of DST3-T
The DST3-T is equipped with a high current power supply and low-voltage (resistive) thermal evaporation platform suitable for a wide variety of thermal evaporation applications. The sputter coating system allows controlled thermal evaporation of wide range materials onto the substrate. Different types of thermal evaporation sources (boat, basket, and coil) can be installed on the single thermal source holder.
Clean Vacuum
The vacuum chamber of DST3-T is Cylindrical Pyrex with 300 mm OD and 200 mm H (Adjustable to 250 mm H). The DST3-T is fitted with an internally mounted turbomolecular pump, backed by a 6 m3/h two-stage rotary vane pump (optional). It introduces a clean vacuum without oil contamination which normally exists with an ordinary diffusion pump.
Touch Screen Control
DST3-T is equipped with a 7” coloured touch screen panel using user-friendly software to control and adjust the deposition process data. The vacuum and coating sequence information can be observed as digital data or curves on the touch screen and the last 300 coatings are saved on the history page.
Plasma Treatment (Plasma Cleaner Option)
The triple target sputter coater – DST3-T can be equipped to plasma cleaner as an option. Plasma treatment/cleaning is the process of removing organic matter from the surface of substrate or functionalising it through the use of an ionised gas called plasma. Plasma treatment can modify the wettability of the substrate surface and enhance its hydrophilicity or hydrophobicity for effective subsequent depositions. Also, applying plasma to the substrate before thin film deposition eliminates surface contaminations (C-based, Oxides) and improves the adhesion between the substrate and the subsequent layers.
Sample Holder
The sample holder stage is made in two sizes, of microscope slides, 3 inches (Available in DST3-TA and DST3-TS) and 8 inches (Available in DST3-TS), but the user can order customised sizes according to their needs. Several S-clamps are created on the small sample holders to hold the small samples with a simple method during the rotation.
Specifications
Applications
- Metal, semiconductor, and dielectric films
- Nano and microelectronic
- Solar cell applications
- Co-Sputtering processes
- Glad sputtering
- Optical components coating
- Thin film sensors
- Magnetic thin film devices
- Fine grain structural deposition for SEM and FE-SEM sample preparation
Options
- Quartz crystal sensor
- Spare glass chamber
- Sputtering targets
- Sealing gaskets
- 300 V DC bias voltage
- Plasma cleaner
- 500 ˚C substrate heater
Related Products
Service Support
Comprehensive repairs and servicing
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Your metrology instrumentation is a major investment that is critical to your business operation and success. In today’s competitive climate, it is more important than ever to extend the functionality and peak performance of your metrology equipment years beyond the expiration of your factory warranty. CN Tech’s Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.
With over 20 years’ experience servicing and repairing you can be assured that your system is in safe hands. The independent services we offer include system relocation, maintenance visits, parts and consumables, and break down interventions.
CN Tech’s Support Programs are an economical way to guarantee optimal working condition:
- Annual Preventive Maintenance
- Priority Technical Assistance
- Preferred Parts Availability
- On-Site User Training
- Remote Diagnostics
- No surprise repair expense and much more!
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CN Tech's Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.