Zeta™-300 True Colour 3D Optical Profiler
A 3D non-contact surface topography platform with support for large samples, and integrated vibration isolation. Capable of performing fully automated, high-resolution measurements on a variety of materials, with sequencing and pattern recognition.
The Zeta™-300 supports both R&D and production environments with Multi-Mode optics, easy-to-use software, and a low cost of ownership.
Manufacturer
KLA
A global technology leader who make an impact by creating solutions that drive progress and transform industries. Collaboration is the key to their success. KLA provide leading-edge technology and devices using advanced inspection tools, metrology systems, and computational analytics. Their solutions accelerate tomorrow’s electronic devices. They enable evolution and innovation in the data era across key industries including automotive, mobile and data centre.
ZDot™
The ZDot™ technology also simplifies operation and setup, by projecting a focusing onto the samples top and bottom surfaces. When the top or bottom surface is correctly focused, the ZDot™ grid will appear in the highest contract, making it fast and intuitive to correctly set up samples. The Zeta-388 is easy to operate, even for less experienced users.
Shown left: The ZDot™ grid visible when the bottom surface is in focus
Shown Right: The ZDot™ grid visible when the top surface is in focus
Key Features
- Easy to use 3D optical profiler with ZDot and Multi-Mode optics to address a wide range of applications
- High-quality 3D microscope sample review or defect inspection
- ZDot: Simultaneously collects a high-resolution 3D scan and a True Colour infinite focus image
- ZI: Zeta phase and vertical scanning interferometry (PSI and VSI) enable wide area measurements with high z resolution
- ZIC: Interference contrast for quantitative 3D data of surfaces with sub-nanometre roughness
- ZSI: Shearing interferometry for images with high z resolution
- ZFT: Film thickness and reflectance is measured with an integrated broadband reflectometer
- AOI: Automatic optical inspection to quantify defects on the sample
- Production capability: Fully automated measurements with sequencing and pattern recognition
ZDot™ High Resolution 3D Topography & Imaging
The Zeta-300 is able to collect high-resolution 3D topography data simultaneously with True Colour infinite focus imaging. This made possible by KLA’s patented ZDot™ technology, which uses proprietary 3D measurement technology and powerful computer algorithms to provide the highest quality results. ZDot™ allows the Zeta-300 to operate quickly and efficiently, providing a high throughput, while maintaining an impressive level of clarity and accuracy.
Shown left: ZDot™ High Resolution 3D Topography Data
Shown Right: ZDot™ Infinite Focus True Colour Imaging
Multi-Mode Optics
To provide the maximum amount of flexibility, the Zeta optical profilers feature Multi-Mode Optics, integrating 6 different optical metrology methods into a single instrument. This comprehensive range of capabilities can be further enhanced with white light interferometry, Nomarski interference contract microscopy, and shearing interferometry. Film thickness measurements are supported a on a wide variety of materials. Combined with a range of motorised stage options, the Zeta-300 is a flexible and powerful solution for defect review and sample inspection across a wide range of materials.
Industries
- LED: light emitting diodes and PSS (patterned sapphire substrates)
- Semiconductor and compound semiconductor
- Semiconductor WLCSP (wafer-level chip scale packaging)
- Semiconductor FOWLP (fan-out wafer-level packaging)
- PCB (printed circuit board) and flexible PCB
- MEMS: Micro-electro-mechanical systems
- Medical devices and microfluidic devices
- Data storage
- Universities, research labs and institutes
And more: Contact us with your requirements
Applications
Step Height
The Zeta-300 3D non-contact optical profiler is capable of measuring 3D, non-contact step heights from nanometres to millimetres. ZDot and Multi-Mode optics provide a range of methods to measure the step height. ZDot is the primary measurement technique and can quickly measure steps from tens of nanometres to millimetres. ZXI interferometry can be used to measure steps from nanometres to millimetres over a large area. ZSI shearing interferometry can be used to measure steps less than 80nm.
Film Thickness
The Zeta-300 optical profiler is capable of measuring film thickness of transparent film(s) using ZDot or ZFT measurement techniques. ZDot is used to measure transparent films greater than 10µm, such as photoresist or microfluidic device layers that are coated on higher refractive index substrates. ZFT uses an integrated broadband reflectometer to measure films from 30nm to 100µm. This can be done for a single or multiple-layer film stack, with the user entering the properties of the film or using a model to fit the spectrum.
Texture: Roughness and Waviness
The Zeta-300 3D profiler measures 3D texture, quantifying the sample’s roughness and waviness. ZDot enables measurement of roughness ranging from tens of nanometers to very rough surfaces. ZSI and interferometry enable measurement of smooth surfaces, from angstroms to microns. Software filters separate the measurements into roughness and waviness components and calculate parameters, such as root mean square (RMS) roughness. Nomarski interference contrast microscopy enables visualising very fine surface detail by revealing small changes in the slope.
Form: Bow and Shape
The Zeta-300 non-contact profiler can measure the 2D and 3D shape or bow of a surface. This includes measurement of wafer bow that can result from mismatch between layers during the production of semiconductor or compound semiconductor devices. The Zeta-300 can also quantify the 3D height and radius of curvature of structures, such as a lens.
Stress: Thin Film Stress
The Zeta-300 is capable of measuring stress induced during the manufacture of devices with multiple layers, such as semiconductor or compound semiconductor devices. The bow of the surface is accurately measured using a stress chuck to support the sample in a neutral position. The change in shape from a process, such as film deposition, is then used to calculate the stress, applying the principles of Stoney’s equation. The Zeta-300 measures 2D stress by finding the height of the sample surface at user-defined intervals across the full sample diameter and then combining the data into a profile of the sample shape.
Automated Defect inspection
The Zeta-300 is capable of Automated Optical Inspection (AOI) to rapidly inspect the sample, differentiate different defect types, and map defect density across the sample. When combined with the 3D metrology capability, the Zeta-300 can provide additional information about the defect that cannot be obtained with 2D inspection systems, enabling quicker identification of the defect source.
Defect review
Zeta-300 defect review uses an inspection tool KLARF file to drive the stage to the defect locations. The user can inspect the defect with the high-quality microscope or measure the topography of the defect, such as the height, thickness, or texture. This provides additional detail about the defect that cannot be obtained from a 2D defect inspection system. The Zeta-300 can also mark defects with a scribe, making it easier to find the defect on tools, such as SEM review tools, that have a limited field of view.
Downloads
Zeta-300 True Colour 3D Optical Profiler Brochure 2023
Objective Lens Selection
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Options
ZFT: Zeta Film Thickness
The Zeta-300 offers an integrated broadband spectrometer for transparent, thin film thickness measurements from 30nm to 100µm. It is capable of measuring single layer or multi-layer stack film thickness with the user selecting the refractive index values from the library of materials. The film thickness can be mapped across the sample to determine the sample uniformity. ZFT works on some of the least reflective surfaces, such as samples with reflectance of less than 0.1%. Many film thickness tools have difficulty obtaining a signal from these type of surfaces, since they depend on specular reflected light to calculate phase change or other parameters. The broadband white light and normal incidence illumination allow the tool to be used for a variety of optically transparent films with low reflectance.
ZXI: Zeta Vertical-Scanning Interferometry
The Zeta-300 supports phase scanning interferometry (PSI) and vertical scanning interferometry (VSI) when combined with the piezo stage and an interferometric objective lens. PSI enables fast measurements of step heights from angstroms to hundreds of nanometres. VSI enables measurement of step heights from hundreds of nanometres to hundreds of microns. Both are performed at better than nanometre-level resolution, independent of the objective numerical aperture.
ZIC: Zeta Interference Contrast
The Zeta-300 utilizes Nomarski differential interference contrast microscopy to provide enhanced imaging of fine surface detail. Nomarski microscopy uses polarization and a prism to change the phase to enhance changes in slope on the sample surface. This enables visualization of defects on super-smooth surfaces, such as a monolayer of a contaminant. The ZIC scanning mode can convert these images into quantitative measurements of sub-nanometre level roughness by correlating the change in slope with roughness measured by another technique.
ZSI: Zeta Shearing Interferometer
The Zeta-300 shearing interferometer measurement technique (ZSI) enhances the ZIC measurement by adding a change in the phase. Multiple images are collected with different phases, then processed through advanced algorithms to generate a quantitative measure of surface topography with angstrom-level resolution. This technique does not require interferometric objectives and has no Z-stage scanning, resulting in high-resolution measurements from angstroms to 80nm.
Objective Lenses
A broad range of objective lenses are available including 1.25x – 150x normal objectives, long working distance objectives, ultra-long working distance objectives, refractive index corrected objectives, through transmissive objectives, liquid immersion objectives, and vertical scanning interferometry objectives.
Couplers
The Zeta-300 can be configured with four different optical couplers to change the optics magnification. The system can be configured with the 1x coupler to keep the native magnification, or configured with 0.35x, 0.5x, or 0.63x couplers to increase the magnification.
Objective Lens Turret
The Zeta-300 can be configured with a 5 or 6 position manual turret and an objective lens sensor for automatic objective identification. The system can also be configured with a 6 position motorized turret for fully automated operation.
Sample Lighting
The Zeta-300 uses dual high-brightness white LEDs as standard lighting. Backlighting through the sample chuck is also available to enhance the light for challenging transparent samples, such as patterned sapphire substrates (PSS). The Zeta-300 also supports darkfield lighting from the side.
Stages
The Zeta-300 can be configured with a variety of stages to enhance system performance. A piezo Z-axis stage can be added to improve Z resolution for measurement of nanometre-level step heights with the ZDot or ZXI measurement modes. The Z-stage can be mounted on a swivel to enable rotating the head about the sample to change the angle of incidence on the surface. An optional 280mm Z tower can accommodate large parts, such as tablets, phones and large machine components. The XY stage can be configured with a manual 300mm travel or motorized 150 or 200mm travel. A manual rotary stage can be added to the XY stage. A manual tip and tilt stage can be added to level the stage for interferometry measurements.
Sample Chucks
The Zeta-300 has a range of chucks available to support application requirements. Backlight chucks are available for transparent substrates to support transmitted illumination, required for patterned sapphire substrates. Support for multiple wafer sizes, including 300mm, and multiple sample chucks are available. If we do not have the chuck you need, please contact us with your requirements.
Isolation Tables
The Zeta-300 has passive isolation built into the base of the system. For applications requiring better isolation, an active isolation table is available. The Zeta-300 has an acoustic enclosure option to isolate the system from environmental noise to enhance measurement capability for nanometre-level steps and roughness.
Step Height and Film Thickness Standards
The Zeta-300 uses thin and thick film NIST traceable step height standards offered by VLSI Standards. The standards feature an etched quartz step with a chrome coating. A step height range of 8nm to 250µm is available. An available certified multi-step standard has nominal step heights of 8, 25, 50, and 100µm. The standard has various pitch patterns for XY calibration. A certified film thickness standard is available for ZFT that includes a reference silicon surface and a nominal 270nm silicon dioxide film thickness. Reference roughness and mirror samples are also available.
Automated Sequencing Software
Automated sequencing software utilizes the motorised XY stage to allow the user to program measurement locations on the sample. The system will automatically measure each site and save the results in user-defined folders. An output report with sample statistics is generated to summarize the results. Advanced sequencing software includes pattern recognition to automatically align the sample. This enables fully automated measurements, reducing the impact of operator error. Auto calibration can also be enabled when using embedded standards on the stage.
Stitching Software
Automated image stitching software utilizes the motorised XY stage to combine adjacent scans to generate a stitched data set that is larger than a single field of view. The system automatically measures every site, aligns the images, and combines them into one data set. The results can be analysed like any other results file.
Apex Analysis Software
Apex analysis software enhances the tool’s standard data analysis capability with an extended suite of leveling, filtering, step height, roughness, and surface topography analysis techniques. Apex supports ISO roughness calculation methods plus local standards, such as ASME. Apex also serves as a report writing platform with the capability to add text, annotations, and pass/fail criteria. Apex is offered in eight languages.
Offline Analysis Software
The Zeta-300 offline software has the same data analysis and recipe creation capability that exists on the tool. This enables the user to create recipes and analyse data without using valuable tool time.
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Your metrology instrumentation is a major investment that is critical to your business operation and success. In today’s competitive climate, it is more important than ever to extend the functionality and peak performance of your metrology equipment years beyond the expiration of your factory warranty. CN Tech’s Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.
With over 20 years’ experience servicing and repairing you can be assured that your system is in safe hands. The independent services we offer include system relocation, maintenance visits, parts and consumables, and break down interventions.
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- Annual Preventive Maintenance
- Priority Technical Assistance
- Preferred Parts Availability
- On-Site User Training
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- No surprise repair expense and much more!
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Metrology & Instrumentation Annual Support Programs 2024/25
CN Tech's Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.