Filmetrics® R54-200 and Filmetrics R54-300 Sheet Resistance Mapping Systems
Sheet resistance monitoring is critical to any industry that utilises conductive films, from semiconductor manufacturing to the flexible electronics required to enable wearable technology. The Filmetrics R54 capabilities are optimized for metal film uniformity mapping, ion implant doping and anneal characterization, film thickness and resistivity mapping, and non-contact film thickness measurement with eddy current detection.
Key Features
- Available in Four-Point Probe (4PP) or non-contact Eddy-Current (EC) configuration
- High precision sample stage that accommodates up to 300mm round samples
- Enclosed system facilitates measurement of light-sensitive or environment-sensitive samples
- 15mm maximum sample height
- 4PP sheet resistance measurement spans a ten-decade range on conductive and semiconductive films
- Compatible with all KLA sheet resistance probes
- Smallest EC spot size in the industry
- 210mm square chuck stage option for 200mm configurations
- Electrical certification with NIST-traceable resistor packs, optional
- User-specified sample point mapping using rectangular, linear, polar, and custom configurations
- Easy-to-use software interface
- SECS/GEM interfacing available
Manufacturer
Filmetrics
Filmetrics was founded in 1995 with the mission of making thin-film measurements simple and affordable. Our approach, borne of the microelectronics and software revolution, results in film-thickness measurements that take less than a second - by operators who can be trained in minutes.
Filmetrics® R54-Series Advanced Sheet Resistance Mapping System
Filmetrics® R54-Series systems offers the measurement performance of the Filmetrics R50 inside a light-tight enclosure with additional functionality to support automated X-Y-θ stages for full 200mm or 300mm wafer mapping of semiconductor and compound semiconductor wafers.
Available Models
| Model | Sensor Type | Measurement Range | Maximum Map Diameter | XY Stage Range | Maximum Sample Height |
| R50-4PP | Contact 4PP | 1mΩ/sq – 200MΩ/sq | 100mm | 100mm x 100mm | 100mm |
| R50-EC | Non-contact eddy current | 1mΩ/sq – 50Ω/sq | 100mm | 100mm x 100mm | 100mm |
| R50-200-4PP | Contact 4PP | 1mΩ/sq – 200MΩ/sq | 200mm | 200mm round | 100mm |
| R50-200-EC | Non-contact eddy current | 1mΩ/sq – 50Ω/sq | 200mm | 200mm round | 100mm |
| R54-200-4PP | Contact 4PP | 1mΩ/sq – 200MΩ/sq | 200mm | 200mm x 200mm | 15mm |
| R54-200-EC | Non-contact eddy current | 1mΩ/sq – 50Ω/sq | 200mm | 200mm x 200mm | 15mm |
| R54-300-4PP | Contact 4PP | 1mΩ/sq – 200MΩ/sq | 300mm | 300mm round (Automated X-Y-Θ stages) | 15mm |
| R54-300-EC | Non-contact eddy current | 1mΩ/sq – 50Ω/sq | 300mm | 300mm round (Automated X-Y-Θ stages) | 15mm |
Applications
Metal Film Uniformity
Sheet resistance uniformity of metal films is critical to ensure device performance, and most metal films can be measured by both 4PP and EC. EC is recommended for thicker, highly conductive metal films and 4PP for thinner metal films ( > 10Ω/sq), but very high 4PP/EC correlation ensures accurate results using either method.
The Filmetrics R54 resistivity maps highlight film uniformity, deposition quality, and other process variations. The example at left is a map of a TiWN deposition layer, showing the fingerprint of the batch reactor.
Ion Implantation Process Optimization
The 4PP probe is the standard technique for measuring ion implant processes. The Filmetrics R54 software includes I-V curve plotting and current ramp scans that can be used to optimize the current used during measurement or identify current leakage between an implant layer and the supporting silicon substrate. Contour maps and diameter scans of an ion implant after thermal annealing can identify hot and cold spots due to lamp failure, poor wafer/platen contact, or implant dose variations.
In the example at left, the process was optimized by improving the backside thermal contact. Accurate measurement of the resistance across the wafer diameter provides the necessary information to optimize the heating profile of the reactor to reduce nonuniformity.
Film Thickness/Resistivity/Sheet Resistance
Measured wafer data can be mapped as sheet resistance, film thickness, or resistivity. By entering a resistivity value (or resistance-dependent function) for a material, the thickness can be calculated and displayed; the resistivity can be calculated if the thickness value is entered.
Data Acquisition and Visualization
RsMapper is the R54 intuitive user interface that combines data acquisition and analysis features into a single platform that can be used on the tool itself or for offline analysis. Data acquisition for measurement sites can be easily specified using a variety of coordinate layouts.
The RsMapper platform can display 2D/3D measurement results for quick visualization of critical film uniformity data, as shown for the ion beam scanning issue shown at left. The software easily switches between maps of individual measurement parameters and rotatable 3D profiles to deliver customized views of the process parameters. SECS/GEM basic interfacing is available for remote benchtop operation.
Downloads
R54 Sheet Resistance Measurement Brochure
Application Note Implant Variation Mapping and Laser Annealing Characterisation
Service Support
Comprehensive repairs and servicing
Annual Support Programs
Your metrology instrumentation is a major investment that is critical to your business operation and success. In today’s competitive climate, it is more important than ever to extend the functionality and peak performance of your metrology equipment years beyond the expiration of your factory warranty. CN Tech’s Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.
With over 20 years’ experience servicing and repairing you can be assured that your system is in safe hands. The independent services we offer include system relocation, maintenance visits, parts and consumables, and break down interventions.
CN Tech’s Support Programs are an economical way to guarantee optimal working condition:
- Annual Preventive Maintenance
- Priority Technical Assistance
- Preferred Parts Availability
- On-Site User Training
- Remote Diagnostics
- No surprise repair expense and much more!
Support Contact Example
An example of our service and support contracts are shown below:
Metrology & Instrumentation Annual Support Programs 2024/25
CN Tech's Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.