Evactron® U50 Plasma De-Contaminator™

Evactron® U50 Plasma De-Contaminator™

The Evactron U50 De-Contaminator is a compact, high performance yet simplified plasma cleaner for instruments and chambers designed to operate at UHV conditions.

Manufacturer

Evactron Plasma Cleaning by XEI Scientific

XEI Scientific, Inc. is the recognised leader in downstream plasma cleaning. The Evactron® Plasma De-Contaminator™ is an RF plasma cleaner that reduces hydrocarbon contamination in vacuum chambers. This significantly improves electron microscope imaging and analytical performance. Evactron plasma cleaners can also be used as an in-situ solution for cleaning EUV and X-ray optics as well as SEM and TEM samples. The Evactron De-Contaminator plasma cleaner can be installed on most vacuum chambers and electron microscopes. Controllers in rack mounted or tabletop configurations are available.

Key Features

  • RF Power: 75W peak, up to 50W continuous
  • Dual action cleaning using plasma and UV afterglow
  • Energy efficient radio frequency hollow cathode plasma (RFHC)
  • Conflat 2.75 flange for UHV compatibility
  • Programmable power, cleaning time, number of cycles, recipes
  • Tethered touchpad command communications module
  • Wide range pressure operation: 0.3 Pa/ 2 mTorr to 80 Pa/ 600 mTorr
  • Bakeable to 150⁰C
  • TMP compatible, no advance venting needed
  • Fast cleaning, 100X+ faster than earlier generation Evactron models
  • Non-damaging to sensitive components – no sputter etch
  • Leak tested to <10-11 Torr or 10-11 mBar (1.3E-9 Pa)
  • Push button cleaning operation
  • No match or gas flow adjustments needed for plasma ignition
  • TUV, NRTL, SEMI, CE and RoHS compliant

Overview

The U50 delivers high power cleaning for removal of hydrocarbon contamination on chamber and sample surfaces. The compact design of the Evactron U50 Plasma Radical Source (PRS) makes it a versatile solution for either instrument chambers, load locks, or sample prep chambers. The Evactron U50 offers fast, effective, and powerful cleaning over a wide range of pressures, enabling hydrocarbon-free RGA spectra and fast pump down time to UHV.

Specifications

  • Evactron U50 plasma radical source
  • Desktop controller with pushbutton operation
  • Tethered touchpad communication package
  • Hardware interlock
  • Chassis dimensions: W×H×D: 17.2”×3.5”×8.6”
    (44×8.9×22 cm)
  • RF Power: 35 – 75 Watts at 13.56 MHz RFHC
  • 100-240 VAC 50/60 Hz input
  • RoHS Compliant

Service Support

Comprehensive repairs and servicing

Annual Support Programs

Your metrology instrumentation is a major investment that is critical to your business operation and success. In today’s competitive climate, it is more important than ever to extend the functionality and peak performance of your metrology equipment years beyond the expiration of your factory warranty. CN Tech’s Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.

With over 20 years’ experience servicing and repairing you can be assured that your system is in safe hands. The independent services we offer include system relocation, maintenance visits, parts and consumables, and break down interventions.

CN Tech’s Support Programs are an economical way to guarantee optimal working condition:

  • Annual Preventive Maintenance
  • Priority Technical Assistance
  • Preferred Parts Availability
  • On-Site User Training
  • Remote Diagnostics
  • No surprise repair expense and much more!

Support Contact Example

An example of our service and support contracts are shown below:

Brochures

Metrology & Instrumentation Annual Support Programs 2022/23

CN Tech's Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.

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