Evactron® E50 ET-C
The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
The compact design of the Evactron E50 Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 Plasma Cleaners offer fast, effective, and powerful cleaning over a wide range of pressures enabling high quality, artefact free images and increased efficiency of sample analysis.
Key Features
- RF power: 75W peak, 50W continuous power output
- Fast cleaning: 100x+ faster than earlier generation Evactron models
- Dual action cleaning: Advanced cleaning using both plasma and UV afterglow
- Energy efficient: Hollow cathode, capacitive coupled plasma (CCP) technology
- Pop ignition: Patent-pending ignition technology at high vacuum
- Programmable & smart control: Set power, cleaning time, cycles and recipes via a customer remote or tethered touchpad
- Alternative gases: Run a range of process gases to tailor the cleaning chemistry to your application
- Wide pressure range: Operation from 0.3 Pa (2 mTorr) to 80 Pa (600 mTorr)
- External interlock: Optional external interlock connection for safety
- TMP compatible: No advance venting needed for operation
- Non-damaging: Safe for sensitive components with no sputter etch
- Flexible install: Can be installed on a variety of vacuum chambers or load lock
- Push button operation: Simple. automated cleaning inititation
- Autotune ignition: No match or gas flow adjustments needed for plasma ignition
- Certified: RoHS, CE, NRTL, TUV, and SEMI S2 compliant
Manufacturer
Evactron Plasma Cleaning by XEI Scientific
For almost three decades XEI Scientific has helped researchers, engineers, and manufacturers to maintain cleaner vacuum environments for electron microscopy and advanced analytical instrumentation.
XEI Scientific pioneered downstream plasma cleaning for electron microscopes and introduced the Evactron® De-Contaminator, the first commercial in-situ plasma cleaning system for electron microscope vacuum chambers. Today, Evactron plasma cleaning technology is trusted by laboratories worldwide to remove hydrocarbon contamination, support pristine vacuum conditions, and improve performance across SEM, TEM, FIB, UHV, EUV, X-ray optics, and specimen-preparation applications.
Their mission is straightforward: to help scientists and engineers achieve cleaner systems, clearer data, and more dependable results. As XEI Scientific enters its next chapter, we remain committed to practical innovation, responsive customer support, and the high standards of quality and reliability that have defined the Evactron name.
Evactron® E50 E-TC Alternate Gas De-Contaminator™
The Evactron E50 E-TC Alternate Gas plasma cleaner has two configurations: an ultrahigh-purity filter (3nm pore size) version to meet the stringent requirements of the semiconductor industry SEMI F38-0699 directive and the precision filter (0.5µm pore size) version for general lab conditions. The in-line filters prevent the introduction of particulates from gas feedlines into the plasma stream. Alternate gases which have been tested include O2, CDA, Ar/ H2, Ar/O2, N2/H2, N2. The use of 100% H2 is not recommended for safety reasons.
Evactron® E50-OEM Plasma De-Contaminator™
The Evactron E50-OEM Plasma De-Contaminator was designed for OEM integration for SEM, FIB, high vacuum, and other analytical instruments. This simplified Evactron Plasma Radical Source (PRS) has a small footprint and utilises air plasma afterglow to reduce hydrocarbon contamination, delivering results quickly and efficiently.
Downloads
E50 Product Sheet
E50 Alternate Gas Configurations
Related Products
Service Support
Comprehensive repairs and servicing
Annual Support Programs
Your metrology instrumentation is a major investment that is critical to your business operation and success. In today’s competitive climate, it is more important than ever to extend the functionality and peak performance of your metrology equipment years beyond the expiration of your factory warranty. CN Tech’s Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.
With over 20 years’ experience servicing and repairing you can be assured that your system is in safe hands. The independent services we offer include system relocation, maintenance visits, parts and consumables, and break down interventions.
CN Tech’s Support Programs are an economical way to guarantee optimal working condition:
- Annual Preventive Maintenance
- Priority Technical Assistance
- Preferred Parts Availability
- On-Site User Training
- Remote Diagnostics
- No surprise repair expense and much more!
Support Contact Example
An example of our service and support contracts are shown below:
Metrology & Instrumentation Annual Support Programs 2024/25
CN Tech's Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.