Evactron® E-Series Plasma De-Contaminators

Simple yet high performance cleaners for SEMs, TEMs, and FIBs. The E-Series delivers cleaning with simplicity for higher resolution and contrast imaging plus improving detector and probe sensitivity that are compromised by contamination.

Manufacturer

Evactron Plasma Cleaning by XEI Scientific

XEI Scientific, Inc. is the recognised leader in downstream plasma cleaning. The Evactron® Plasma De-Contaminator™ is an RF plasma cleaner that reduces hydrocarbon contamination in vacuum chambers. This significantly improves electron microscope imaging and analytical performance. Evactron plasma cleaners can also be used as an in-situ solution for cleaning EUV and X-ray optics as well as SEM and TEM samples. The Evactron De-Contaminator plasma cleaner can be installed on most vacuum chambers and electron microscopes. Controllers in rack mounted or tabletop configurations are available.

Key Features

  • High Cleaning Efficiency
  • Compact Size Plasma Source
  • TMP & Turbomolecular Pressure Operation
  • "Pop" Ignition
  • Touch Screen Interface
  • Vacuum Safety Interlock

E-Series Plasma Cleaning System

The Evactron E-Series have been designed to provide a simple to operate method of effective chamber cleaning. Evactron’s EP and ES plasma decontaminators feature the classic Evactron plasma source, which uses and interior electrode, providing compact but high performance cleaning. Cleaning is fast, effective, and gentle, ensuring high-quality and artefact-free imaging and analysis results.

Easy to operate, the E-Series are controlled via touch screen interface, providing simple “one button” cleaning, as well as advanced controls for power levels, timing and cycle operations. Evactron’s E-Series are suitable for use with a range of equipment, including SEM and FIB chambers, high vacuum instruments, and sample preparation chambers.

Sample Cleaning

A build-up of hydrocarbon contamination inside instruments or on samples will degrade the quality of imaging and analysis data. Evactron’s plasma decontamination technology provides a simple and effective means of removing contamination from samples and equipment, without requiring complex processing or inducing sample damage. The Evactron technology uses RF plasma to chemically etch and remove hydrocarbons, organics and surface carbon.

Shown Left: Sample with contamination
Shown Right: Sample cleaned with Evactron®

 

Product range

Evactron® E50 Plasma De-Contaminators
Evactron® E-Series Plasma De-Contaminators
Evactron® Zephyr™ Plasma Cleaners
Evactron® Easy Plasma SoftClean™

 

Specifications

  • Dual action cleaning through plasma and UV afterglow
  • Energy efficient hollow cathode RF plasma generation
  • “Pop” Ignition at high vacuum for instant ignition
  • User programmable cleaning recipes, controlling power, cleaning time, and cycles
  • Touch screen tablet interface with Bluetooth communication
  • USB & RS-232 serial interface for external control
  • Wide range of pressure operation between 0.3Pa/2mTorr to 80Pa/600mTorr
  • TMP compatible with no advance venting needed
  • 60X+ faster than earlier generation Evactron models
  • Gentle cleaning does not damage sensitive components - no sputter etch
  • Compact plasma source fits on chambers with confined space
  • Simple “one button” cleaning operation

To learn more about the Evactron® E-Series Plasma De-Contaminators, please contact us today. The team of technical experts at CN Tech are ready to help ensure the highest quality imaging and analysis. Contact us today!