Evactron® E-Series Plasma De-Contaminators
Simple yet high performance cleaners for SEMs, TEMs, and FIBs. The E-Series delivers cleaning with simplicity for higher resolution and contrast imaging plus improving detector and probe sensitivity that are compromised by contamination.
Manufacturer
Evactron Plasma Cleaning by XEI Scientific
XEI Scientific, Inc. is the recognised leader in downstream plasma cleaning. The Evactron® Plasma De-Contaminator™ is an RF plasma cleaner that reduces hydrocarbon contamination in vacuum chambers. This significantly improves electron microscope imaging and analytical performance. Evactron plasma cleaners can also be used as an in-situ solution for cleaning EUV and X-ray optics as well as SEM and TEM samples. The Evactron De-Contaminator plasma cleaner can be installed on most vacuum chambers and electron microscopes. Controllers in rack mounted or tabletop configurations are available.
Key Features
- High Cleaning Efficiency
- Compact Size Plasma Source
- TMP & Turbomolecular Pressure Operation
- "Pop" Ignition
- Touch Screen Interface
- Vacuum Safety Interlock
Evactron® E-Series Plasma De-Contaminators™
The Evactron E-series De-Contaminators feature simple operation and ignition at high vacuum and are led by the E50 plasma cleaner with external hollow cathode RF (XHCRF) plasma radical source (PRS). Its cousins the Evactron EP and ES Decontaminators have lower power PRS with the classic Evactron plasma source with an interior electrode. They are compact, high performance yet simplified plasma cleaners. They share the similar control packages with provision for control and recipe setting by an external computer of tablet device by either USB cable or wireless Blue tooth connection. The E50 and EP models can be operated with a single push button for turning plasma on and off. Using external commands, power levels, timing, and cycle operation can be programs.
The compact designs of the Evactron E-Series Plasma Radical Sources make them a versatile solution for SEM/FIB chambers, high vacuum instruments, sample preparation chambers, ion beamlines and advanced physics experimental chambers. The Evactron E-Series Plasma Cleaners offer fast, effective and gentle hydrocarbon removal over a wide range of pressures, enabling high quality, artefact-free imaging and increased efficiency of sample analysis.
System Features
- Dual action cleaning by means of plasma and UV afterglow
- Energy efficient hollow cathode RF plasma
- “POP” Ignition (patent pending) at high vacuum for instant ignition
- Programmable power, cleaning time, number of cycles, recipes
- Android tablet with Bluetooth communication or RS-232 serial interface.
- Wide range pressure operation: 0.3Pa/2mTorr to 80Pa/600mTorr
- TMP compatible, no advance venting needed
- Fast cleaning, 60X+ faster than earlier generation Evactron models
- Non-damaging to sensitive components – no sputter etch
- Compact Plasma Radical Source fits on accessory-laden chambers
- Simple pushbutton cleaning operation
- No match or gas flow adjustments needed for plasma ignition or operation.
- Optional external operation hardwire interlock connection.
- 100-240 VAC 50/60 Hz input
- CE/TUV/NRTL safety certified
- RoHS Compliant
Evactron® Model E16 Plasma De-Contaminator™
The Evactron® E16 De-Contaminator is a compact yet simplified plasma cleaner for Electron and Ion Beam Instrument load locks such as SEMs, TEMs, FIBs, and sample preparation chambers. The E16 delivers gentle and effective cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
New design features of the Evactron® E16 Plasma Radical Source (PRS) include a unique flush-mounting flange and compact size to fit in restricted spaces on a chamber wall. The Evactron® E16 Power Centre controller has a small footprint and can be placed horizontally or vertically to conserve space.
System Specifications
- RF Power: 5 to 16W continuous
- Energy efficient radio frequency hollow cathode plasma (RFHC)
- Compact PRS – WxHxD: 2.5”x2.125”x3.75” (6.3×5.4×9.5cm)
- Programmable ignition power, cleaning power, cycle time, number of cycles
- Power Centre controller – WxHxD: 12.25”x3.5”x9.34”(31×8.9×23.7cm)
- Touchpad programming of cleaning recipes
- Wide range of pressure operation: 1 Torr to 1.0 E-3 Torr
- Fixed input air flow rate, no adjustments needed
- Turbo pump compatible
- PRS can be flush-mounted on the chamber or the load lock
- No match or gas flow adjustments needed for plasma ignition
- TÜV, NRTL and CE safety certified
Evactron® Model E50 Plasma De-Contaminator™
The Evactron® E50 Plasma De-Contaminator is the most powerful model in the Evactron E-Series family of products. E50 plasma cleaner with external hollow cathode RF (XHCRF) plasma radical source (PRS) combines high performance cleaning with simplified design and simple operation.
The E50 system was designed to be user installed for removal of hydrocarbon contamination from high vacuum chambers such as SEMs, FIBs and large volume chambers. The Evactron E50 Plasma De-Contaminator fits most models of SEM and FIB systems with turbo pump evacuation systems. In operation it provides The Fastest Way to Pristine for SEM or FIB instruments.
System Specifications
- Desktop controller with push-button operation
- Android tablet with Bluetooth communication or RS232 serial interface.
- Simple programing commands for OEM integration
- PRS with External RF hollow cathode plasma excitation.
- Vacuum safety interlock and hardware interlock
- Chassis dimensions: WxHxD: 2”x3.5”x8.6” (44×8.9x22cm)
- RF Power: 20-75 watts at 13.56 MHz XRFHC excited
- 100-240 VAC 50/60 Hz input
- CE/TUV/NRTL safety certified
- RoHS Compliant
Evactron® Model ES Plasma De-Contaminator™
The Evactron® ES Plasma De-Contaminator is designed for OEM integration on high vacuum scientific and analytical instruments. This simplified Evactron Plasma Radical Source (PRS) utilizes air plasma oxygen radicals and UV afterglow to reduce hydrocarbon contamination, delivering results quickly and efficiently. Its very small size and low power make it desirable for integration on small volume vacuum instruments such a vacuum coaters and mass spectrometers.
System Specifications
- SEM/FIB host-directed control
- 2U rack mount controller for system integration
- Optional hardware interlock
- Small compact Plasma Radical Source (PRS)
- RF Power: 10-20 Watts at 13.56 MHz CCP
- 100-240 VAC 50/60 Hz input
- CE/TUV/NRTL safety certified
- RoHS Compliant
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