DST3-T, is equipped with a 7” colored touch screen and semi-automatic control and data input that can be operated by even inexperienced users. The vacuum and deposition information can be observed as digital data or curves on the touch screen. Information of the last 300 coating can also be saved in the history page.
DST3-TS - Sputter + Thermal Evaporation – Straight Cathodes
The DST3-T Triple Target Turbomolecular Pumped Sputter Coater is a multi vacuum coater system combining thermal evaporator and sputter coater in one single compact desktop system. The high vacuum system is suitable for deposition of a wide range of materials. Triple magnetron target desk sputter coater can easily switch between Evaporation and Sputtering condition (Not Simultaneously).
Manufacturer
Vac Coat
Vac Coat Limited is a designer and manufacturer of high-quality tailor-made Physical Vapour Deposition (PVD) and Vacuum Coating Systems with excellent customer care and after sale services. Equipped with more than 25 years’ experience in the vacuum and Thin Film deposition technologies. Their research and development team supported by academic scientists and qualified engineers are highly active to develop new designs and meet special inquiries received from clients. Designed and manufactured components by Vac Coat's engineering team meets high-quality standards. Their vacuum coating systems have been sold to many universities and research centres through distributors worldwide with very good references and feedback.
Key Features
- Sputtering and Thermal Evaporation process in a compact system
- High vacuum level
- Equipped with DC and RF power supplies suitable for metals, semiconductors and dielectrics
- Three 2” water-cooled angled, magnetron cathodes suitable for producing alloy films (DST3-TA) and multilayer deposition
- One thermal source installation
- Two fixed and movable quartz crystal monitoring system for real time thickness measurement (1 nm precision)
- Two MFCs
- Manual or automatic Timed or Thickness deposition
- Intuitive touch screen to control coating process and rapid data input
- User friendly software that can be updated via network
- Equipped with 3 manual shutters
- Tillable and change height of rotary sample holder with ability to selection of the cathodes
- 500 °C substrate heater (optional)
- 300 V DC substrate bias voltages (optional)
- Unlimited deposition time without breaking vacuum
- Two-year warranty
DST3 –TS (Straight Cathodes)
DST3-TS with three straight 2 inches water-cooled cathodes is suitable for sputtering a single large specimen with diameter up to 20 cm or several small specimens.
Splutter Coater & Thermal Evaporator
The DST3-T Magnetron Desk Sputter Coater is equipped with a large chamber (300 mm diameter) and three 2” diameter water-cooled cathodes which make it suitable for long time deposition. The magnetron desk sputter coater is equipped with RF and DC power supplies. It can sputter semiconductors dielectrics and metal (oxidizing & noble) targets.The system is equipped with an auto adjustable matching box minimizing the reflected power in the RF sputtering process. For increasing film adhesion to the substrate and to improve the film structures a 300 V DC bias voltage can be applied to the substrate (optional).
Thermal Evaporation
The DST3-T is equipped with a high current power supply and low-voltage (resistive) thermal evaporation platform suitable for a wide variety of thermal evaporation applications. The system allows controlled thermal evaporation of wide range materials onto substrate. Different types of thermal evaporation sources (Boat, Basket, and Coil) can be installed on the single thermal source holder.
Touch Screen Control with Colorful Display
Sample Holder
The holder is made according to the conventional size of microscope slides, but the user can order customize size according to his/her needs. On the sample holder number of clamps is created to hold the small samples with a simple method during the rotation.
Clean Vacuum
The vacuum chamber is Cylindrical Pyrex with 300 mm OD and 200 mm H. The DST3-T is fitted with an internally mounted 90 l/s Turbomolecular Pump, backed by a 1.4 m3/h diaphragm or 4 m3/h two stage Rotary Vane Pump.
Plasma Cleaner
DST3-T is equipped to plasma cleaner option. Plasma cleaning is the process of removing organic matter from the surface of substrate through the use of an ionized gas called plasma. Pre-Cleaning the substrate prior to the deposition of film to eliminate contamination (C-based, Oxides) from substrate surface improve the adhesion between the substrate and the subsequent layers.
Specifications
Pump | High Vacuum Turbomolecular Pump |
Pumping Speed | 90 l/s 350 l/s |
Ultimate Pressure | 7×10-6 Torr 7×10-7 Torr |
Rotary Vane Pump | Two stage rotary vane pump 4 m3/h |
Control | Independent sputtering control rate for each cathode to produce fine grain structures |
Power Control | Automatic control of deposition power independent of pressure |
Temperature Control | Automatic control of the cathode’s temperatures to protect the life time of the magnets |
Water-cooled | Water-cooled high current electric feedthrough |
Mass Flow Controller | Two precision Mass Flow Controller (MFC) for fine control of Ar flow and so reactive sputtering gas |
Graphs | Records and plots of coating parameters graphs |
Transfer | Transfers curves and deposition process data by a USB port to PC |
Voltage (optional) | 300V DC bias voltage (optional) |
Plasma Cleaner (optional) | Equipped to plasma cleaner (optional) |
Substrate Heater (optional) | Equipped to 500˚C substrate heater (optional) |
DC Power Supply | 0-1200V, 0-500 mA |
High Current Power Supply | 0-24 V, 0-100 A |
RF Power Supply | 300 W RF power supply with automatic matching box |
Utilities | 220V-240V, 50/60HZ, 16A |
Box Dimensions | 50 cm H x 60 cm W x 47 cm D |
Shipping Weight | 160 kg (Pump, Rack and Box) |
Applications
Metal, Semiconductor and Dielectric Films
Nano [&] Microelectronic
Solar Cell applications
Co-Sputtering processes
Glad Sputtering
Optical components coating
Thin film sensors
Magnetic thin film devices
Fine grain structural deposition for SEM [&] FE-SEM sample preparation
Downloads
DST3-T Brochure
Options
Quartz crystal sensor
Spare vacuum glass chamber
500˚C substrate heater
Plasma cleaner
300V DC bias voltage
Thermal source materials
Sputtering targets
Service Support
Comprehensive repairs and servicing
Annual Support Programs
Your metrology instrumentation is a major investment that is critical to your business operation and success. In today’s competitive climate, it is more important than ever to extend the functionality and peak performance of your metrology equipment years beyond the expiration of your factory warranty. CN Tech’s Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.
With over 20 years’ experience servicing and repairing you can be assured that your system is in safe hands. The independent services we offer include system relocation, maintenance visits, parts and consumables, and break down interventions.
CN Tech’s Support Programs are an economical way to guarantee optimal working condition:
- Annual Preventive Maintenance
- Priority Technical Assistance
- Preferred Parts Availability
- On-Site User Training
- Remote Diagnostics
- No surprise repair expense and much more!
Support Contact Example
An example of our service and support contracts are shown below:
Metrology & Instrumentation Annual Support Programs 2024/25
CN Tech's Support Programs will help ensure that your investment is protected, and that you and your instrument’s are always operating at peak performance.