The International Conference on Microscopy of Semiconducting Materials will meet this year for the 21st time. This biennial conference has promoted the most recent advances in imaging and analysis of semiconductor materials for over 40 years. This year the conference is organised by the Institute of Physics, and will be held in Cambridge, UK.
Primarily focused on electron microscopy applications, MSM also features scanning probe microscopy, atomic force microscopy, x-ray topography and many other techniques. MSM attracts researchers and engineers from around the world, and frequently features over 100 contributors.
This year, for MSM-XXI the conference will discuss a range of topics, including atom probe techniques, lattice defects, quantum wires and quantum dots, scanning electron and ion beam techniques, and many others. So far, 14 speakers haven been confirmed, and a selection of networking and social activities are also planned.
A commercial exhibition will be running alongside MSM-XXI, and CN Tech will be attending to share our comprehensive range of surface analysis solutions with attendees. CN Tech provides solutions for semiconductor imaging and analysis in both research and industry.
We offer both full-size and desktop Scanning Electron microscope systems from COXEM, with a range of upgrade options. We can also provide a range of accurate and easy to use Atomic Force Microscopes from Park Systems, a leading innovator in AFM technology. CN Tech is also a distributor for surface profilometry and nanoindentation systems from KLA, an industry-leading developer of analysis tools for the semiconductor industry.
The MSM-XXI conference will be held at Fitzwilliam College in Cambridge, UK, from the 9th to the 12th of April 2019. The commercial exhibition will be held on the 11th and 12th April. For more information, and to register for the meeting please visit the IoP website. To discover more about CN Tech’s semiconductor analysis solutions, please explore the COXEM SEM and Park Systems AFM areas of our website.